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The Nickel Iron Target from EximNext is precision-engineered for the demanding needs of physical vapor deposition (PVD) applications. This high-quality NiFe sputtering target is essential for industries focused on thin film deposition, making it a key component in various technological processes.
Key specifications include: 1. Composed of Nickel Iron alloy (NiFe 80/20), ensuring optimal performance in sputtering applications. 2. Manufactured under strict quality control standards to meet industry requirements. 3. Available in various sizes and thicknesses to suit different PVD equipment and processes. 4. Designed for high purity and consistency, essential for achieving superior film quality in semiconductor manufacturing.
This Nickel Iron Target is ideal for use in the semiconductor industry, electronics manufacturing, and research institutions focused on materials science. Its versatility allows it to be utilized in various applications, including magnetic film targets and other advanced materials applications.
EximNext offers this product at competitive pricing with flexible MOQ options, catering to both small and large-scale buyers. Our Nickel Iron Targets come with relevant certifications, including ISO and SGS, ensuring compliance with international quality standards. We provide multiple shipping options (FOB, CIF) and payment methods (L/C, T/T) for your convenience.
By sourcing from EximNext, you gain access to verified suppliers, export-quality materials, and a global marketplace dedicated to fulfilling all your industrial needs.
| HS Code | 7505.11 |
| Brand | EximNext |
| Material | Nickel Iron Alloy NiFe 80/20 |
| Grade/Type | NiFe 80/20 (Permalloy composition) |
| Purity/Composition | Nickel 80%, Iron 20% | Purity 99.9% min |
| Size/Dimensions | Custom; standard 3" dia x 6mm or 4" dia x 6mm |
| Standard | ASTM F305, Vacuum Metallurgy Standards |
| Application | PVD Sputtering, Thin Film Deposition, Magnetic Recording, Semiconductor Fabrication |
| Packaging | Vacuum-sealed in PE bag, cushioned crate for export |
| Origin | Subject to supplier; varies by manufacturer |
The Nickel Iron Target (NiFe 80/20) is a high-purity sputtering target engineered for physical vapor deposition (PVD) and thin film coating applications in semiconductor, magnetic storage, and optical industries. Designed for consistent film uniformity and minimal particle generation during sputtering, this target is essential for manufacturing magnetic read/write heads, microelectronic circuits, and decorative coatings. Widely traded internationally, NiFe sputtering targets are sourced globally from specialty metallurgy manufacturers and exported under standard industrial packaging with full material certifications including composition analysis and impurity reports.
| 企业类型 | Supplier |
| 成立年份 | Contact Supplier |
| Employees | Contact Supplier |
| Annual Revenue | Contact Supplier |
| Main Products | View Products Tab |
| Major Markets | Global |
| 响应时间 | <4h |
| 响应率 | Contact Supplier |
Nickel Iron Target is offered by Shanghai Spark Advanced Material Co., Ltd, a Supplier based in China. This supplier provides wholesale quantities suitable for bulk importers, distributors, and businesses worldwide. Contact the supplier to request pricing, discuss trade terms, and arrange shipping to your destination.
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